roll-to-roll sputtered ito/cu/ito multilayer electrode for flexible, transparent thin film heaters and electrochromic applications - pet thin film
We make high
Performance, flexibility, transparent discoloration (EC)
Film and film heaters (TFHs)
On ITO/Cu/ITO (ICI)
Continuous rolling preparation of multi-layer electrodes-to-roll (RTR)
Sputtering of ITO and Cu targets. The RTR-
At room temperature, the film resistance of the ICI multi-layer film deposited on the mm-wide PET substrate is 11.
8 Ω/square, optical transmission ratio 73.
9%, it is acceptable for the manufacture of flexible and transparent EC films and TFHs.
The effect of Cu mezzanine thickness on the photoelectric properties of ICI multi-layer films was studied in detail.
The test of bending and cyclic fatigue shows that RTR-
Due to the high strain destruction of the Cu sandwich, the sputtering ICI multilayer film is more flexible than the single ITO film.
The flexible transparent EC film and TFHs prepared on ITO electrode showed better performance than the reference EC film and TFHs made with a single ITO electrode.
In order to achieve flexibility, transparency and low cost, the sputtering ITO Multilayer film is the best alternative to the conventional ITO film electrode
Effective and large
Area EC devices and TFHs that can be used as flexible smart windows.
ICI multi-layer films are continuously splashed on PET substrates with a width of 700 and a length of 100 μm using pilot at room temperature-
Scale RTR sputtering system (Ulvac SPW-060, Japan).
Before the bottom ITO layer is splashed, the PET substrate removes moisture in the vacuum chamber through a 300 °c heater.
Then, an Ar/O beam operated at a 300 w DC pulse power is used to pre-treat the surface of the PET substrate by irradiation.
After surface treatment on the PET substrate, the bottom ITO layer of 35 nm thickness is deposited on the PET substrate using a rectangular ITO double target (950mm x 127mm);
The operating conditions are as follows: in
Range frequency (MF)power of 2.
2 kw, working pressure 3 mTorr, Ar/O flow 400/4 sccm, rolling speed 1. 0u2009m/min.
After coating the bottom ITO layer, when the working pressure is 3 mTorr, the Ar flow rate is 400 sccm, the Cu mezzanine is continuously deposited on the bottom ITO layer as a function of the Cu thickness, the rolling speed is 1. 0u2009m/min.
The thickness of the Cu layer is controlled by the DC power supply provided to the Cu target, with a range of 0. 2 to 0. 6u2009kW.
After copper mezzanine deposition, 35 nm-
A thick top ITO layer was sprayed on the Cu sandwich.
In order to form a symmetrical ITO structure, the sputtering condition of the top ITO layer remains the same as that of the bottom ITO layer.
Electrical and Optical Properties of RTR-
Hall measurements were carried out on the sputtering ICI multi-layer specimens (
HL5500PC optical technology)
And UV/visible spectrometer (UV 540, Unicam).
The structure of ICI multi-layer film was examined by X-
Ray diffraction (XRD).
The mechanical properties of ICI multi-layer films were evaluated using a specially designed internal and external bending system.
The external bending test causes the tensile stress on the film, while the internal bending test causes the compressive stress.
In addition, Dynamic fatigue bending and distortion tests were performed using the laboratory
A cyclic bending and torsion testing machine is designed at 0.
5 hz in 10,000 cycles.
The resistance of the ICI multi-layer film was measured throughout the cycle bending process. The RTR-
Sputtering ICI multilayer films on PET and ITO/glass substrates (